进口实验室常用耗材>多孔氮化硅支撑膜铜网
 
多孔氮化硅支撑膜铜网
 
货号: 100940 规格: 多种规格 价格: 询价
CAS号:
编号: MK1140
包装: 多种包装
产品咨询     查看大图    
 

Advanced MEMS technologies have been applied to incorporate many improvements into this truly unique next generation Holey Silicon Nitride Support Membrane. Holey membranes or support films are also referred to as perforated or patterned films; there is no film or membrane covering the holes. The platform for this holey silicon nitride support film is the low stress 200nm amorphous silicon nitride support film on a circular 3mm silicon frame with a 0.5 x 0.5mm window. There are ten hole sizes available ranging from 2500nm to 100nm. This design has a number of advantages over previously offered products:

  • Relatively large open area
  • Closely packed, higher pore density using hexagonal pore pattern
  • Added resilience of membrane
  • Practical hole size for experiments
  • TEM standard circular shape and size
  • EasyGripTM edge for improved handling

The PELCO(R) Silicon Nitride Support Films are resistant to solvents, acids and bases, allowing for dynamic experiments directly on the holey membrane. The Silicon Nitride Support Films allow for high temperature experiments/imaging up to 1000°C. Films can be easily cleaned using glow discharge or plasma cleaning techniques. They also provide a carbon-free background for TEM imaging and analysis. The clean manufacturing techniques avoid the debris particles that are often found on other makes of silicon nitride support films.

产品信息:


产品规格和包装:


Single Pore Sizes


产品规格和包装:


Multiple Pore Sizes


产品规格和包装:


其他信息:

详情请发邮件至:mknano@126.com

关于大发888网页版手机版登陆   新闻中心   更多信息   合作企业
关于大发888网页版手机版登陆
大发888网页版手机版登陆愿景
大发888网页版手机版登陆石墨烯
应用领域
  大发888网页版手机版登陆新闻
产品新闻
行业动态
  法律申明
诚聘英才
 
版权所有 大发888网页版手机版登陆

服务时间:周一至周日 08:30 — 20:00  全国订购及服务热线:025-66171690
联系地址:南京市江宁区科学园芝兰路18号 南京模型公司